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United States
JPEL's History
1969 Founded R&D and production of the following equipment;
*Resist Coater/Developer.
*Epitaxial Grouth System.
*Medical electoronic equipment.
1976 Production start for LP-CVD model VDR-500.
1980 Production start for PE-CVD model VDS-2010.
1981 Production start for the first domestically-made
mass production model PE-CVD VDS-5000.
1982 Production start for in-line type PE-CVD model VDS-6000.
1984 Production start for PE-CVD model VDS-7000, which is
high-throughput model of VDS-6000.
1986 Production start for VDS-5500/5600, succeeding model of VDS-5000.
1990 Production star for Liquid Source CVD model MRS-2000 series.
1991 Production start for Rapid Thermal type CVD model MRS-5000 series.
1994 Production start for Multi Chamber type PE-CVD model VDS-5800DU.
2000 Production start for Single Chamber type PE-CVD model VDS-5800SN.
2004 Production start for compact size PE-CVD model VDS-5800SNC.
2007 Production start for production type PE-CVD model VDS-5900
applicable to 300mm wafer size.
2008 Development start for PE-CVD system for anti-reflective coating film
used for Solar Cell.
2010 Development & production start for an additional model of VDS-5800 series.
2012 Production start for PE-CVD model SJP-3000, production model for Solar Cell
Development & production start for PE-CVD model VDS-5700,
suitable to mass production of LED and R&D of power devices.